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RIS citation export for WEP31: Booster Fillpattern Monitor

TY  - CONF
AU  - Falkenstern, F.
AU  - Kuszynski, J.
AU  - Rehm, G.
ED  - Forck, Peter
ED  - Wawrzyniak, Adriana
ED  - Schaa, Volker R.W.
ED  - Kowalski, Grzegorz W.
ED  - Cudek, Agnieszka (SOLARIS, Kraków
TI  - Booster Fillpattern Monitor
J2  - Proc. of IBIC2022, Kraków, Poland, 11-15 September 2022
CY  - Kraków, Poland
T2  - International Beam Instrumentation Conference
T3  - 11
LA  - english
AB  - The "Booster Fillpattern Monitor" is used to measure currents in each individual electron bunch in the booster of the BESSY II machine. The booster with its circumference of 96 meters has space for max.160 electron bunches. The distance between the electron bunches of 60cm (96m/160) is determined by the RF Master Clock ~ 499, 627MHz. In practice, fill patterns of a one to five equally spaced bunches are in use. The fill pattern monitor digitizes electrical pulses generated from a strip line using a broadband ADC. The sampling frequency is selected as an integer fraction of the bunching frequency, acquiring the full fill pattern over a number of turns. Experiments performed at BESSY II demonstrate the performance of the setup and will be discussed.
PB  - JACoW Publishing
CP  - Geneva, Switzerland
SP  - 473
EP  - 475
KW  - booster
KW  - electron
KW  - storage-ring
KW  - injection
KW  - extraction
DA  - 2022/12
PY  - 2022
SN  - 2673-5350
SN  - 978-3-95450-241-7
DO  - doi:10.18429/JACoW-IBIC2022-WEP31
UR  - https://jacow.org/ibic2022/papers/wep31.pdf
ER  -